Researchers in Switzerland have found an unexpected new use for an optical technique commonly used in silicon chip manufacturing. By shining a focused laser beam onto a sample of material, a team at the Paul Scherrer Institute (PSI) and ETH Zürich showed that it was possible to change the material’s magnetic properties on a scale of nanometres – essentially “writing” these magnetic properties into the sample in the same way as photolithography etches patterns onto wafers. The discovery could have applications for novel forms of computer memory as well as fundamental research. In standard photolithography – the workhorse of the modern chip manufacturing industry – a light beam passes through a transmission mask and projects an image of the mask’s light-absorption pattern onto a (usually silicon) wafer. The wafer itself is covered with a photosensitive polymer called a resist.…